查询词典 electron beam

The results show that an electron efficiency over 27% is predicted for suitable dimensions for the complex cavity and magnetic field coefficient and current and the velocity ratio of the electron beam.

标 签 3 mm波段二次谐波回旋管复合腔多模注波互作用 3mm band Second-harmonic Gyrotron Complex cavity Multiple mode interacting with an electron beam

To make picture clear, the electron beam that must come out to be being hit from electron gun undertakes focusing is handled, let electron beam pass electron lens, be opposite with optical lens of beam of light collect action likeness, the electron beam assemble that opens scattering rises, get on fluorescent screen one shines again small spot, add the effect of scanning circuit, ability shows clear picture.

为了使图像清楚，必须对从电子枪打出来的电子束进行聚焦处理，让电子束通过电子透镜，和光学透镜对光束的聚集功能相似，把散射开的电子束会聚起来，在荧光屏上得到一个又亮又小的光点，加上扫描电路的功能，才能显示清楚的图像。

In order to use electron beam in brazing of precise structures and thermo-sensitive materials,accommodating every kinds of curve brazing seams,a vacuum electron beam brazing temperature closed loop control system was developed using PID controller,electron beam scanning track editing and on-line adjusting technologies,real-time acquisition and handling of brazing temperature.

为了将电子束应用于精密构件及热敏感性材料钎焊，以适应复杂形状曲线钎焊缝的要求，采用电子束扫描轨迹编辑及在线调节、钎焊温度实时采集及PID控制器构建真空电子束钎焊温度闭环控制系统。

The good characteristics of the deflection system of electron gun can be obtained by optimizing the velocity and the location of emitting electron beam and by the aclinic emission of the electron beam, that can be achieved by making the end of the anode and the middle part of the cathode level.

研究结果表明：电子枪阳极板端点与阴极灯丝中心点保持水平可满足电子水平出射；非均匀分布的磁场对e型电子枪中电子束具有良好的聚焦作用；所设计的偏转聚焦系统在电子束流为50~100 mA时，束斑小于3 mm。

Simulative results show that the electron beam can be transported in the unmagnetized plasma-filled for two reasons. The first, the plasma neutralizes the majority of the space charge forces within the beam. The second, radial electric field generated by electron beam interaction with the plasma leads the beam to converge along axis. By PIC simulation, we find that atomic mass of the background ion effects on the Characteristics of the plasma-filled devices.

非磁化等离子体填充的RBWO-FEL的模拟表明只有在一较窄的背景等离子体密度范围内，电子注才能良好传输，产生泵波及激光功率输出，并都存在有峰值功率点，同实验观测到的结果完全吻合；该范围内，电子注的传输是由于背景离子中和了注中径向发散空间电荷力及注在等离子体中产生的径向的电场使注在轴向汇聚。

A circle is placed at the launch point to improve the interaction between the electron beam and the fields supported by the slow wave structure, thus to control the beam current density at the launch point, and to minimize the loss of the electron beam energy. The inaner radii of the extractor vanes are slightly larger than those of other SWS vanes, which increases the axial group velocity and enhances the microwave output power and efficiency. Implementation of two RF choke vanes stops the leakage of microwave pulse power toward the diode, and makes the device more compact than the conventional MILO.

该振荡器在阴极电子发射起点加圆环，控制此处电子束的发射密度，来减少电子能量的损耗，改善束－波互作用；逐渐加大慢波结构的后两个叶片的内半径，增大微波群速度，便于谐振腔中的能量输出，提高微波输出效率；采用两个扼流片有效地阻止了微波功率向二极管区泄漏，相应减小了器件的尺寸。

It is treated with six fields (Anterior, Posterior, four obliques) positioned 60° apart around the circumference of the patient, each dual field is made up of two component beams, pointing ±15° with respect to the horizontal. The nominal energy of electron beam produced by Mevatron Ⅻ is 3MeV, and the patient is treated at a distance of 3 meters. Using Capintec dosemeter and PS-033 electron beam chamber for measurement, one moniter unit of radiation is equivalent to 0.0127cGy. Measurement of electron energy by Kodak X-omat-V verification film inside the Rando phantom at 100 cm SSD was 3.70MeV, electron energy measured at 3 meters was 3.51MeV. X-ray contamination was measured as 9.5% per six dual fields.

此种方法分别使用六个双照野，由病人的前、后、左前、右前、左后、右后各间隔60度共六个方向照射，每一双照野由水平向上和向下15度照射；荣民总医院选择3MeV电子射束来治疗病人，治疗距离为3公尺，利用擬人假体及柯达X-omat-V验证片实验得电子射束初始能量从3.7Mev变为3.51MeV，六个双照野之X光污染共达9.5%，使用Capintec剂量表及PS-033型电子射束用游离腔测量六个双照野，每一监测单位相当於0.00127 cGy。

Experiment 1. Observation of electron beam deflection in the electric field Will voltage electron beam deflection plate to tie the direction switch "is" location, rotating clockwise direction deflection plate voltage Potentiometers (RP2), the electron beam is deflected upward, the greater the voltage between the deflection plate, the electron beam deflection angle the bigger.

实验一。观察电子束在电场中的偏转将电子束偏转板电压方向开关扳到&上正&位置，顺时针方向旋转偏转板电压电位器(RP2)，电子束则向上偏转，偏转板之间电压越大，则电子束偏转的角度越大。

Will voltage electron beam deflection plate to tie the direction switch "is" location, rotating clockwise direction deflection plate voltage Potentiometers (RP2), the electron beam is deflected upward, the greater the voltage between the deflection plate, the electron beam deflection angle the bigger.

实验一。观察电子束在电场中的偏转将电子束偏转板电压方向开关扳到&上正&位置，顺时针方向旋转偏转板电压电位器(RP2)，电子束则向上偏转，偏转板之间电压越大，则电子束偏转的角度越大。

GHz ridge－loaded helical groove slow wave structure with a 20kV electron beam are given and the investigations of the effect of the ridge dimensions and electron beam parameters on the small signal gain are carried out. It is indicated from the calculation results that this type of structure is suitable for use as s SWS of high power, high gain but narrow passband millimeter TWT, of which the 3dB gain bandwidth is 3.4%. In order to increase the bandwidth, the reduction of the ridge gap or the increase of the electron beam current in an allowable range may be useful.

GHz的脊棱加载慢波结构的具体尺寸，并对此结构中小信号增益随脊尺寸的变化情况及电子注参数对其影响进行了研究，计算结果表明：此结构适宜于作为高增益窄带毫米波大功率行波管的慢波线，其3dB增益带宽为3.4%，为了展宽其工作带宽，可以适当减小间隙宽度，也可在一定范围内提高电子注电流。

The labia have now been sutured together almost completely.The drains and the Foley catheter come out at the top.

此刻阴唇已经几乎完全的缝在一起了，排除多余淤血体液的管子和Foley导管从顶端冒出来。

To get the business done, I suggest we split the difference in price.

为了做成这笔生意，我建议我们在价格上大家各让一半。