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crystal glass相关的网络例句

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与 crystal glass 相关的网络例句 [注:此内容来源于网络,仅供参考]

By enchasing it into crystal glass is too cutesy and by sticking it to a brochure is too worldly.

把它镶嵌在水晶玻璃里面吧——太造作,把它贴在小册子里面吧——又太庸俗。

Apply to material quality: The electron is similar to insulant kind products cutting and half cutting (such as: ML , PC , PU steep cotton , EVA , two-sided glue , rubber etc.), PET , PE , PT , PS , SMT cover board , cold light movie , pressure overcome the force , ABS , crystal , glass , plastic cement , leatherware , marble/ stone , hardboard , wood products , cloth , rubber/ seal, paint metal etc..

适用材质:电子类绝缘材料类制品的切割与半切割(如:ML,PC,PU泡棉,EVA,双面胶,橡胶等),PET,PE,PT,PS,SMT罩板,冷光片,压克力,ABS,水晶,玻璃,塑胶,皮革制品,大理石/石头,硬纸板,木头制品,布料,橡胶制品/印章,上漆金属等。

To satisfy the customers' need to splice patterns, in the procedure of reprocessing, the panels are processed to heteromorphosis by man-made crystal glass.

为了满足客户拼接图案的需要,再加工工序用水钻对板材进行异性加工。

It could consist by invisible sensor grid of touch-sensible wires drowned in a crystal glass positioned in front of real monitor screen, or it could consist of an infrared controller inserted into the frame surrounding the monitor screen itself.

它可以包括的无形传感器网格的触摸明智的电线被淹死在水晶玻璃的位置前面的实时监控画面,也可以包括一个红外控制器插入帧周围的监测屏幕本身。

Each crystal glass is melt in 1450℃,through de-waxing the cast、delicate color mixing,and creat each lazurite in 850℃~900℃.

以1450℃高温熔炼出水晶玻璃,透过脱腊混色铸造精致工艺方式,在低温850℃~900℃制作出琉璃艺术品。

Lead bound in crystal glass as defined in Annex I (Categories1, 2, 3, and 4) of Council Directive 69/496/EEC

水晶玻璃中铅含量的限定依照欧盟指令69/493/EEC 附件 I (第1、2、3、4类)。

O 29. Lead bound in crystal glass as defined in Annex I (Categories 1, 2, 3 and 4) of Council Directive 69/493/EEC.

理事会第69/493/EEC号指令附件一(第1,2,3及4类)所指水晶玻璃含有的铅。

Lead bound in crystal glass as defined in Annex I (Categories 1, 2, 3 and 4) of Council Directive 69/493/EEC OJ

水晶玻璃中铅含量的限值(参考欧盟指令69/493/EEC附件1、2、3、4类,最后修改于2003法案

New gift items were also added to the product line, including multiple-purpose bags, A3 posters and crystal glass key chains.

集团亦推出主题式推广宣传活动,以刺激「快趣印」的销售,包括母亲节宣传计划以及圣诞卡及月历推广行动。

A common heating oxidation device(fig.1)is to place a silicon plate in a quartz crystal glass reaction chamber. In the reaction chamber, a electric resistant wire heating device heat up the chamber to a certain temperature(usually, the temperature is 900~1200℃. In a special condition, it can be descended to under 600℃). When oxygen or water vapour pass through the chamber(typical gas flow speed is 1cm/s). A chemical reaction is generated on surface of the silicon plate.

常用的热氧化装置(图1)将硅片置于用石英玻璃制成的反应管中,反应管用电阻丝加热炉加热一定温度(常用的温度为900~1200℃,在特殊条件下可降到600℃以下),氧气或水汽通过反应管(典型的气流速度为1厘米/秒)时,在硅片表面发生化学反应

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