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Hot cathode glow discharge chemical vapor deposition is a new method to deposit high quality diamond films with h...

热阴极辉光放电等离子体化学气相沉积是我们建立的快速沉积高品质金刚石膜的新方法。

Hot cathode glow discharge chemical vapor deposition is a new method to deposit high quality diamond films with high deposition rate.

热阴极辉光放电等离子体化学气相沉积是我们建立的快速沉积高品质金刚石膜的新方法。

Especially, cathode temperature has a strong influence on the discharge property of cathode fall region via its influence on electron emission process. This is one of the most typical properties of hot cathode glow discharge.

特别是阴极温度对放电特性的影响，它是通过热阴极的温度对热电子发射过程的影响来实现的，也是区别于常规冷阴极辉光放电的一个重要放电特征。

Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge.

相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式，对于它的工作特性，我们以前知之甚少，对于放电特性与制备工艺之间的关系也没有掌握，影响了沉积工艺的优化，没有达到最佳沉积效果。

Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate.

建立了快速沉积高品质金刚石膜的热阴极辉光放电等离子体化学气相沉积新方法。

Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.

大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。

Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge. The discharge characteristics and their relation to diamond film deposition process are almost unknown to us.

相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式，对于它的工作特性，我们以前知之甚少，对于放电特性与制备工艺之间的关系也没有掌握，影响了沉积工艺的优化，没有达到最佳沉积效果。

This paper studies depression in the hot cathode glow discharge PCVD method of diamond films influence in the process, mainly from two aspects of research: a study of the process of discharge pressure of the impact of that pressure on the technology, the impact of state discharge , as well as pressure and discharge voltage of the relationship between the two, and experiment with different pressure, relative to the preparation of samples, and using Raman instrument and SEM analysis of the quality of the film, by comparing the different types of gas pressure on the quality of diamond films, summed up the most good gas pressure parameters of a high-quality diamond films.

本文研究气压在热阴极辉光放电PCVD方法制备金刚石膜过程中的影响，主要是从两个方面进行研究：一，研究制备过程中气压对放电的影响，得出气压对工艺，放电状态的影响，以及气压和放电电压的关系；二，采用不同气压进行实验，制备出相对应的样品，并用Raman和SEM等仪器对膜进行质量分析，通过对比不同气体压强对金刚石膜质量的影响，总结最佳气体压强参数，制备出高品质金刚石膜。

Also the discharge current and gas pressure are both high. The study of the cathode properties such as its material, reaction with gases in a PCVD ambient, temperature, surface state, etc, comes to the conclusions which are much different with that of the cold cathode glow discharge.

由此导致了对于阴极材料的选择、阴极在PCVD气氛中的反应、阴极的工作温度、表面状态等涉及到阴极性质的研究工作，均得到有别于常规冷阴极辉光放电的具有热阴极特征的结论。

The diamond film deposition experiments with hot cathode glow discharge PCVD shows that the cathode temperature has no apparent influence on deposition rate and film quality. With the increase of gas pressure, the gas density, electron temperature, gas dissociation rate in the plasma region change differently.

在热阴极辉光放电PCVD沉积金刚石膜中，适当的阴极温度是保证大电流、高气压辉光放电稳定工作的必要条件，它影响着辉光放电阴极位降区的放电性质，但对金刚石膜的沉积速率和膜品质基本没有影响。

The absorption and distribution of chromium were studied in ryeusing nutrient culture technique and pot experiment.

采用不同浓度K2CrO4(0，0.4，0.8和1.2 mmol/L)的Hoagland营养液处理黑麦幼苗，测定铬在黑麦体内的亚细胞分布、铬化学形态及不同部位的积累。

By analyzing theory foundation of mathematical morphology in the digital image processing, researching morphology arithmetic of the binary Image, discussing two basic forms for the least structure element: dilation and erosion.

通过分析数学形态学在图像中的理论基础，研究二值图像的形态分析算法，探讨最小结构元素的两种基本形态：膨胀和腐蚀；分析了数学形态学复杂算法的基本原理，把数学形态学的部分并行处理理念引入到家实际应用中。