查询词典 aperture mask

We also compared with experimental results by changing the aperture size of 54.7 degree mask.

模拟结果指出具54.7度斜角开孔的蒸镀遮罩与基板的距离必须缩短以提高蒸镀图形的解析度。

A three-mask chip process was first attempted in this work, where the 3rd mask was designed to evaporate the identical metal films for p- and n-pads. However, it was found that the Cr film showed inferior adhesion property on the ITO current spreading layer after the peeling test. In order to overcome this problem, a contact aperture was opened in the mask of ITO layer.

改为三道光罩后，P、N电极使用同一道光罩，并蒸镀相同的金属，但实验后发现，铬和氧铟锡的附著性并不好，经黏贴测试后，发现有电极剥落的情形，所以我们在透明导电层的光罩上，做了个圆孔的设计，这个圆孔的设计可以得到二个优点。

A fan-shaped aperture mask was designed, the aperture mask cooperate with a 3-axies worktable, makes up the micro-drilling system.

设计了扇形掩模，依据三轴联动加工台，设计了掩模钻孔加工系统，在此基础上研究了掩模旋转钻孔的加工参数。

Alternating aperture phase shift mask is an advanced technology to enhance lithography resolution by adding phase shifters to the mask, which corrects the pattern distortion caused by diffraction of light in deep sub-wavelength lithography.

交替移相掩模是一种通过对掩模版进行相位偏移而提高光刻分辨率的先进工艺技术，用来解决深亚波长光刻下由于衍射效应引起的图形失真问题。

Finally, a two-mask process was attempted to extend the same concept of the chip process. Here the mask of the contact aperture was replaced by the mask of the LED pad. After etching the SiO2 and ITO in the aperture region, a lateral etch of SiO2 was made to increase the ITO contact area. Although the forward voltage of the GaN LED shows a normal value, the process yield is still low and requires further study.

二道光罩制程延伸了三道光制程的理念，只是因为透明导电层的圆孔图形，是用电极的光罩去开的，所以蚀刻完二氧化矽膜及氧化铟锡膜后，必须再做二氧化矽膜的回蚀刻，让二氧化矽再内缩进去，以增加氧化铟锡和电极的接触面积，不会造成发光二极体的顺向电压提高，但因制程良率太低，所以还须要继续研究改善。

Alternating aperture phase shift mask; phase assignment; tri-connected components; phase conflict detection; dynamic priority search tree

信息科技，无线电电子学，微电子学、集成电路交替移相掩模技术；相位分配；三连通分支；相位冲突检测；动态优先搜索树

Then threekind of hard X-ray space telescopes, namely the collimator, the rotating col-limator and coded aperture mask telescopes, are introduced. Finally the softX-ray imaging telescope is introduced.

然后分别介绍了三种类型的硬X射线空间望远镜，包括准直型、旋转调制型和编码孔径型望远镜，最后简略介绍掠入射型软X射线成像望远镜。

Our process capability: Plates: FR4, High TG FR4, high CTI FR4, high frequency materials, halogen-free materials, aluminum and other low-rise Materials :2-20 layer of finished copper thickness :0.5-5 OZ finished thickness: 0.2 -6.0mm Minimum line width: 3mil Minimum line spacing: 3mil smallest shape tolerances:+/-0.1mm minimum finished diameter: 0.1mm maximum thickness aperture ratio: 12:1 wide minimum solder bridge: 4mil characters minimum line width: 5mil Minimum height of characters: 30mil Solder Mask Color: Green, black, blue, white, yellow, purple characters such as color: white, yellow, black and other surface processes: spray tin, lead-free HASL, Electroless gold plating Shuijin, OSP, chemical Shen tin, silver and other chemicals Shen Process: Goldfinger, blue gum, Blind-via/Buried-via, characteristic impedance control, rigid-flexible combination of reliability testing such as: Open / Short testing, impedance testing, solderability testing, thermal shock testing, metallographic analysis of micro-slice curvature Isoptera: 0.7% flame retardant Level: 94V-0

我们公司的制程能力：板材：FR4、高TG FR4、高CTI FR4、高频材料、无卤素材料、铝基材料等层数：2-20层成品铜厚：0.5-5 OZ成品板厚：0.2-6.0mm最小线宽：3mil最小线间距：3mil最小外形公差：+/-0.1mm最小成品孔径：0.1mm最大板厚孔径比：12：1最小阻焊桥宽：4mil最小字符线宽：5mil最小字符高度：30mil阻焊颜色：绿色、黑色、蓝色、白色、黄色、紫色等字符颜色：白色、黄色、黑色等表面工艺：喷锡，无铅喷锡、化学沉金、电镀水金、OSP、化学沉锡、化学沉银等其它工艺：金手指、蓝胶、盲埋孔、特性阻抗控制、刚柔结合等可靠性测试：开/短路测试、阻抗测试、可焊性测试、热冲击测试、金相微切片分析等翅曲度：≤0.7%阻燃等级：94V-0

In this research, we prepared Mo doped ZnO thin films on glass a substrate using co-sputtering to improve the conductivity of ZnO. The incorporated concentration of Mo atoms in ZnO was controlled by adjusting the aperture size of a shutter palaced in front of the Mo target. Textured morphology of ZnO film could be formed by attaching a metallic mask on the substrate.

本研究，欲以钼(Molybedeun， Mo)金属掺杂来提升氧ZnO薄膜之导电性，使用一般玻璃做为基板，利用射频溅射ZnO靶材及直流溅射Mo靶材进行共镀，Mo掺杂浓度是藉由钼靶前之挡板中的开口大小来控制，实验中改变基板温度(50℃、100℃、200℃、300℃)并进行镀膜后低压退火处理，藉此探讨Mo掺杂对於ZnO薄膜光电特性之影响，并找出最佳化制程参数。

The absorption and distribution of chromium were studied in ryeusing nutrient culture technique and pot experiment.

采用不同浓度K2CrO4(0，0.4，0.8和1.2 mmol/L)的Hoagland营养液处理黑麦幼苗，测定铬在黑麦体内的亚细胞分布、铬化学形态及不同部位的积累。

By analyzing theory foundation of mathematical morphology in the digital image processing, researching morphology arithmetic of the binary Image, discussing two basic forms for the least structure element: dilation and erosion.

通过分析数学形态学在图像中的理论基础，研究二值图像的形态分析算法，探讨最小结构元素的两种基本形态：膨胀和腐蚀；分析了数学形态学复杂算法的基本原理，把数学形态学的部分并行处理理念引入到家实际应用中。