查询词典 CMP

To perform CRS stack depends on the determination of three wave attributes,compared with conventional common middle point stack and dip move out stack,CRS stack can focus more energy in the vicinity of the reflector,therefore can obtain a better zero offset section by stacking events with same phase.

共反射面元的旅行时响应由三个波场属性参数确定，相比常规共中心点(commonmiddlepoin ，CMP)叠加和倾角时差校正(dipmoveout，DMO)叠加，CRS叠加算子能够将地下反射点附近一个邻域内的能量进行聚焦并实现同相叠加，因此能得到更好的零炮检距剖面。

Synthesis of benzylamine: benzyl/NH3.H2O=l: 2.5?

0%收率：87。 9%；&CMP&合成：&NBNA&/三氯氧磷/DMF/氯苯=1：2。

The theory of stack technique of variable binning comes from definition of first Fresnel Zone .

变面元叠加技术的理论基础来源于第一菲涅耳带定义，据此，可以随深度增加进行扩大面元处理，以增加同一CMP道集内的叠加道数，达到增强有效波能量且消除各类干扰波的目的。

Residue organic matter pollution is introduced in Post-CMP.The theory of the oxidability of peroxide synthesized by the BDD anodes used in the electrochemical is introduced.

提出硅片化学机械抛光后表面残留的有机物污染，介绍金刚石膜电化学合成过氧化物的方法与原理。

The CMP record was processed by conventional flow, and stacked and deviated sections were obtained, the response characters of pinchout sand bodies are analyzed, the seismic attributes such as root-mean-square amplitude and its variation are determined as sensitivety parameters of oil and gas reservoirs, a concept seismic-geologic model of sublacustrine fan reservoir is established, by which the multiplicity and limitation are reduced for prediction, a basis is provided for seismic interpretation.

对共炮点记录进行常规处理，得到叠加和偏移剖面。分析尖灭砂体的地震响应特征，确定了均方根振幅和振幅变化率等地震属性为含油气储层敏感参数。并建立了湖底扇储集体概念化地震地质模型，减少了预测的多解性和局限性，可为地震解释提供科学依据。

Aiming at the characteristics of scheduling tasks on CMP chip multiprocessor , a genetic algorithm baaed on tri-dimensional coding method is put forward .

针对在片上多处理器上任务调度的特征，提出了一种基于立体编码的遗传算法。

Mask Laser Writer, Probe card ,Reticle Case, Test Equipment for Memory, CMP, E-Beam Inspection,Ion Implantation , Optical Defect Inspection , Optical Probe, Therma Probe,Test Reticle Mask

激光绘图光刻机，光学探针，探针卡，掩膜盒，DRAM测试系统，电子束检测设备，光学缺陷检测设备，热探针，测试掩膜版

The dressers' design factors and the parameters of the dressing process are apparently crucial to the performance of CMP process.

可见修整器设计因数的掌握，以及修整器的加工参数选择，是化学机械抛光制程是否能充分发挥的关键因素。

Because of the ray asymmetry of the downgoing and upgoing waves, the velocity analysis based on the CMP gather cannot be adapted to that of the converted wave.

转换波上、下行波的不对称性，使得常规基于共中心点道集的速度分析不能适用于转换波。

Some new processes and technologies in electronics finishing such as wafer plating, e CMP ,MEMS plating,lead and cadmium free electroless nickel,copper plating using insoluble anode and recycling of etching solution for PCB industry and platinized niobiumelectrode are briefly introduced.

文对电子电镀中若干新工艺新技术如芯片电镀、化学机械抛光、 MEMS 电镀、PCB 工业中采用不溶性阳极电镀铜工艺以及铜蚀刻液回收再生、无铅无镉化学镀镍、镀铂铌电极等进行了简要介绍。

According to the clear water experiment, aeration performance of the new equipment is good with high total oxygen transfer coefficient and oxygen utilization ratio.

曝气设备的动力效率在叶轮转速为120rpm～150rpm时取得最大值，此时氧利用率和充氧能力也具有较高值。

The environmental stability of that world - including its crushing pressures and icy darkness - means that some of its most famous inhabitants have survived for eons as evolutionary throwbacks, their bodies undergoing little change.

稳定的海底环境─包括能把人压扁的压力和冰冷的黑暗─意谓海底某些最知名的栖居生物已以演化返祖的样态活了万世，形体几无变化。