离子注入机

基本解释 (translations)

implanter

与离子注入机相关的网络例句 [注：此内容来源于网络，仅供参考]

An ion implanter and an ion implanting method compatible for both positive and negative ions.

一种离子注入机和一种对正离子和负离子均适用的离子注入方法。

Introduced the configuration of typical ion implanter ,analyzed the importance of the implantation mechanical scanning technology.

简单介绍了典型离子注入机的组成，分析了离子注入机中扫描技术的重要性。

An end station for an ion implanter has a vacuum chamber which receives an ion beam.

离子注入机的一个终端站具有用于接收离子束(19)的一个真空室(18)。

For 115 keV nitrogen ion beam output from the implanter, the current measured at the entrance of the TEM is 100-180 nA.

离子注入机输出的115keV氮离子在电镜人口测得的束流强度达100~180 nA。

Vertical scanner is the supporting part of a series process ion implanter , which transfer high speed movement from outside of the chamber to the target inside.

垂直扫描机构是单晶片离子注入机靶盘的支撑部件，起着将高速直线运动从靶室外传递到靶盘的作用。

This paper took the high temperature rotation scanning target of the high-current oxygen ion implanter which was designed by the Forty-eighth Institute of CETC as the research object, present modeling and simulation of this target, by utilizing parameter feature modeling and virtual prototype technology.

本文以中国科技集团公司研制的大束流专用强流氧离子注入机的高温旋转扫描靶为研究对象，结合参数化特征建模技术和虚拟样机技术，对高温旋转扫描靶的建模和仿真做了探索性的研究。

Using virtual prototype technology to study high temperature rotation scanning target in this paper, it not only obtained a certain achievement, but also laid the foundation for applying virtual field technology in other key parts even and all of the high-current oxygen ion implanter.

本文应用虚拟样机技术来研究高温旋转扫描靶，取得了一定的成果，为今后将虚拟样机技术推广到强流氧离子注入机其它关键部件乃至整机的研究奠定了基础。

The ion implanter has an ion extractor and a mass analyzer for deflecting ions in a predetermined direction regardless of the charged state of the ions. A polarity converter changes the flux direction of a magnetic field in the mass analyzer according to the charged state of the ions.

该离子注入机具有：离子分离器；质量分析器，用于按照预定方向偏转由离子分离器导入的离子，而无论离子的带电状态如何；以及极性转换器，用于按照离子的带电状态来改变质量分析器中磁场的通量方向。

The first tandem-implanter-TEM interface system in China, consisting of a 2×1.7 MV tandem accelerator, a 200 kV ion implanter, a H800 transmission electron microscope and the beam transport system, was established recently.

建立了由2×1.7 MV串列加速器、200kV离子注入机、H800型透射电子显微镜和联机传输系统组成的我国第1套串列加速器－离子注入机－透射电子显微镜联机装置。

Main product: Ion implanter, Diffusion/Oxidation furnace, Plasma etching system, PECVD, High temperature sintering furnace ,MOCVD, Vaccum furnace, Silicon crystal growing furnace, Electronics industry kiln and furnace ,Solar cell, Pressure sensor.

主要产品：离子注入机，扩散/氧化炉，等离子刻蚀机，PECVD，高温烧结炉，MOCVD，真空炉单晶炉，电子工业窑炉，压力传感器等。

与离子注入机相关的网络解释 [注：此内容来源于网络，仅供参考]

ill conditioned matrix：病态矩阵

ion implanter 离子注入机 | ill-conditioned matrix 病态矩阵 | IEEE 802 standards IEEE (电气和电子工程师学会)802标准

implanter：离子注入机

implanted oxide 离子注入氧化物 | implanter 离子注入机 | implosion 聚爆

ion implanter：离子注入机

ion implantation 离子值入,离子移植 | ion implanter 离子注入机 | analysis method 离子微探针质谱仪分析法

implanted oxide：离子注入氧化物

implanted impurity 注入杂质 | implanted oxide 离子注入氧化物 | implanter 离子注入机

LG：长度

锥形角阴影效应会形成非对称性晶体管,从而限制栅极长度(Lg)的微缩,高转速转盘的转动则会导致粒子(particle)引起的多晶硅结构失效. 但是通过扫描式单晶片离子注入机1-D离子束机械扫描和较高分子量掺杂材料(B10H14或B18H22)的使用,