- 更多网络例句与掩模相关的网络例句 [注：此内容来源于网络，仅供参考]
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Adaptive subdivision is performed only in the areas facing to the viewpoint in the pre-process. And in the each adaptive subdivision, we choose the normal angle of the adjacent faces as the control error to detect whether the approximation is sufficient. Sharp edges are automatically tagged according to the given thresholdθand subdivision masks are designed based on different sharp degrees.
在预处理过程中，只选取面向视点的网格作为能够被进一步自适应细分的网格；在自适应细分过程中，用相邻面片的法向夹角作为控制误差来反映细分的逼近程度是否足够；并根据预设的阈值θ自动标记网格中的尖锐特征边，重新设计尖锐特征处的权值掩模。
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A fan-shaped aperture mask was designed, the aperture mask cooperate with a 3-axies worktable, makes up the micro-drilling system.
设计了扇形掩模，依据三轴联动加工台，设计了掩模钻孔加工系统，在此基础上研究了掩模旋转钻孔的加工参数。
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Alternating aperture phase shift mask is an advanced technology to enhance lithography resolution by adding phase shifters to the mask, which corrects the pattern distortion caused by diffraction of light in deep sub-wavelength lithography.
交替移相掩模是一种通过对掩模版进行相位偏移而提高光刻分辨率的先进工艺技术，用来解决深亚波长光刻下由于衍射效应引起的图形失真问题。
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Experimental results indicate that silicon tips of octahedron and tetrahedron are fabricated with changing mask directions. The direction of mask does not affect the rapid etched crystal planes at the fixed solution concentration and temperature.
实验结果表明：当腐蚀溶液浓度和温度一定时，正方形掩模的方向并不影响快腐蚀晶面的类型，利用正方形掩模的偏转，可以制备出八面体和四面体的硅尖。
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Choosing different values of red, green and blue to form different colors, masks composed of these colors can be obtained by color film recorder.
通过选取不同RGB值组合成特定颜色，由彩色胶片输出仪输出这些颜色组成的彩色掩模，获得的彩色胶片掩模用来线性调制曝光量，从而实现二元光学元件台阶深度的线性化。
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The main characteristics, such as the matching behaviors of films coated on substrates in fabrication of concave cylinder photoresist microlens arrays, the structural parameter design of photoetching mask which is relevant to the fabrication of the microlens, and control basis of photoresist mask technological parameters, are analyzed respectively.
分析了在光致抗蚀剂柱凹微透镜图形制作过程中的膜系匹配特性，与制作该种微透镜有关的光掩模版的主要结构参数，以及光致抗蚀剂掩模工艺参数的控制依据等。
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The research on the UV photosensitivity in germanosilicate fibers is of double importance in both theory and practice.
重点研究了位相光栅掩模复印法，采用标量衍射理论对位相光栅掩模的近场衍射特性进行了分析，具体研究了写入光正入射和斜入射条件下的成栅特点，得出了一些重要结论。
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With the increased design complexities brought in by applying different RETs, post-RET sign-off verification is quickly becoming necessary.
分辨率增强技术的应用使得光刻用掩模图形日趋复杂，而掩模制造成本和制备时间也随之增加。
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Photoresist becomes viscous when heated above its glass transition temperature, so the line of photoresist mask can be smoothened.
为了消除重力的影响，在倒置状态下对光刻胶掩模进行高于其玻璃转变温度以上的烘烤，尽量保证光刻胶线条高度的同时得到了光滑的光刻胶掩模，再结合光刻胶灰化技术，进一步得到小占宽比、平直而且干净的光刻胶掩模。
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Because of diffraction and other physical phenomena during mask making, optical lithography and etching under Sub-Wavelength Lithography, the mask patterns are not the same as printed shapes on silicon wafer.
在亚波长光刻下，由于掩模制造、光刻和蚀刻过程中光的衍射及其它物理现象，导致掩模图形和硅片表面实际印刷图形之间不再一致。
- 更多网络解释与掩模相关的网络解释 [注：此内容来源于网络，仅供参考]
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mask artwork：掩模原图
mask aligner 掩模对准器 | mask artwork 掩模原图 | mask carrier 掩模载运体
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mask lithography：掩模光刻
mask lifetime 掩模寿命 | mask lithography 掩模光刻 | mask making facilities 掩模制造设备
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mask lithography：掩模光刻sjG中国学习动力网
mask lifetime 掩模寿命sjG中国学习动力网 | mask lithography 掩模光刻sjG中国学习动力网 | mask making facilities 掩模制造设备sjG中国学习动力网
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mask bit：屏蔽位,掩模位
mask artwork 掩模原图 | mask bit 屏蔽位,掩模位 | mask bus 屏蔽总线
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masked：图片列表中是否包含掩模码
ImageType:在绘制图片时是否使用掩模码 | Masked:图片列表中是否包含掩模码 | Width:图片的宽度
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mask replicator：掩模复制器
mask replication 掩模复制 | mask replicator 掩模复制器 | mask resolution 掩模清晰度
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mask replicator：掩模复制器sjG中国学习动力网
mask replication 掩模复制sjG中国学习动力网 | mask replicator 掩模复制器sjG中国学习动力网 | mask resolution 掩模清晰度sjG中国学习动力网
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reticle pattern：中间掩模图样
reticle masking 中间掩模掩蔽 | reticle pattern 中间掩模图样 | retrieval time 检吮间
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reticle alignment：中间掩模对准
reticle 中间掩模 | reticle alignment 中间掩模对准 | reticle image 中间掩模图像
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master reticle：掩模原版
master plate 母掩模 | master reticle 掩模原版 | master transmitter 症射机