射束聚焦

词组短语

beam-focusing

与射束聚焦相关的网络例句 [注：此内容来源于网络，仅供参考]

We calculate the field distribution near focus of an aplanatic system for incident ASPBs with different polarization orders and initial azimuthal angles, and based on the simulation results, we find some unique focusing properties of the beams, such as ever on-axis energy null, strong longitudinal field, and flowerlike intensity distribution at focus.

计算了不同偏振级次和偏振初始角的轴对称偏振光束当入射到无球差系统时在焦点附近的场分布，通过这些模拟结果，发现了该光束一些独特的聚焦特性，例如光轴强度始终为零、具有较强的轴向光场以及在焦点附近场呈现花瓣状分布等。

The measuring device is structured by including a He-Ne laser; a beam expander, a soft aperture slot and a off-axis parabolic mirror to be measured are arranged in turn along the direction of the emergent laser beam direction of the He-Ne laser; a standard cross hair and a micro objective are arranged in turn on the direction of the reflected beam of the off-axis parabolic mirror; the micro objective is arranged on the focus of the off-axis parabolic mirror; the focus is imaged on an area array CCD; the output end of the area array CCD is connected with a computer; the off-axis parabolic mirror is fixed on a five-dimensional electric adjusting frame.

一种离轴抛物面镜点聚焦能力测定装置和测定方法，测定装置的构成包括：一台He-Ne激光器，沿该He-Ne激光出射激光束方向依次设置扩束器、软边光阑和待测的离轴抛物面镜，在该离轴抛物面镜的反射光束方向依次设置标准叉丝和显微物镜，该显微物镜位于所述的离轴抛物面镜的焦点，所述的焦点成像于面阵CCD上，该面阵CCD的输出端接计算机，所述的离轴抛物面镜固定在一五维电动调整架上。

The position and size of the monochromator, focusing curvature radii and tilting angles of the germanium focusing monochromator under different different take-off angle, size and divergency of the second collimator and intensity loss due to the use of it were determined. The neutron flux at different wavelength, under different reflection and take-off angle of the monochromator and divergency of the first collimator, were given. The simulation on the aperture used for limiting beam size in front of the sample showed that, smaller the size of the aperture and further the distance from the aperture to the sample, greater the loss of the intensity and more serious the spread of the beam along vertical direction at the sample position which makes the practical sampling volume greater than expected.

用蒙特卡罗模拟方法对中子应力衍射谱仪的设计方案进行了优化研究，提出了一系列可供参考的数据：确定了单色器的位置、尺寸、垂直聚焦单色器在不同起飞角下的聚焦曲率半径和倾角；讨论了第二准直器的尺寸和发散，以及使用第二准直器造成的强度损失；给出了在不同单色器反射面、起飞角、中子波长和第一准直器发散度的情况下样品处的中子注量率，以及多种组合情况下谱仪的分辨率曲线；对限束方孔的尺寸、距离样品远近对强度损失和测量中的影响做了深入研究。

This focused primary beam of gallium ions is rastered on the surface of material to be analyzed.

这聚焦的镓离子原射束在被分析的材料表面作光栅式扫描。

Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.

中心现有80多台各种微机电工艺设备，如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机，以及多种常用测试仪器，如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。

The good characteristics of the deflection system of electron gun can be obtained by optimizing the velocity and the location of emitting electron beam and by the aclinic emission of the electron beam, that can be achieved by making the end of the anode and the middle part of the cathode level.

研究结果表明：电子枪阳极板端点与阴极灯丝中心点保持水平可满足电子水平出射；非均匀分布的磁场对e型电子枪中电子束具有良好的聚焦作用；所设计的偏转聚焦系统在电子束流为50~100 mA时，束斑小于3 mm。

The system''s antenna emits a focused beam of millimeter wave energy.

该系统的天线发射出能量为毫米波的聚焦射束。

When 1053 nm 20 ns Nd:YLF laser was used as pump in a 3∶1 inverse expansion system are using attenuators to adjust input energy in the rang of 2 to 92 mJ, the rules of transmitted energy and waveform versus input energy are acquired, and compared with the results of focusing pump.

以波长1053nm、脉宽20 ns的Nd：YLF激光器为光源，采用3∶1的缩束系统，通过衰减片调整入射光能量在2mJ—92mJ变化，获得了透射光能量和功率波形随入射能量变化的规律，并与聚焦条件下的结果进行了比较。