quadric surface

quadric surface的基本解释

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[计] 二次曲面

与quadric surface相关的网络例句 [注：此内容来源于网络，仅供参考]

In addition, some modifications on several computational methods are also presented. Using LMTO method the electronic structure of several systems are studied, and some results are obtained. They are: The ideal Nb (100) surface has three surface states, the multi-layer relaxed surface has two surface states. The surface energy of the ideal surface is higher than that of the relaxed surface, that means that the multi-layer relaxed surface is more stable than the former one, which supports the LEED results. The mono-layer relaxed Ag (111) surface is the most stable one among several" stable surface models"presented by several researchers. The surface energy of Ag (111) surface is higher than that of surface Ag (001), which supports some experimental results such as different reaction rate at different surface orientations for the same material. The surafce states of Si (111) surface not only locate near the Fermi level, but also in the valence band, which agrees well with Cohen's conclusion. Si (111)-H is an effective model for analysing the surface states and H adsorbed on the back surface is a good method for improving the convincingness of the results obtained on thinner slab models. The surface stability depends on three different kinds of MoSi〓(001) surfaces, the surface with mono-layer Si is the most stable one, and the surface with Mo at the first layer is the most unstable one among them. These are consistant with the Kemoda's experimental results. The valence bands of clean or K adsorbed CdTe (111) surface agrees well with the synchrotron radiation studies. The surface of CdTe (111) consists of four kinds of surface models which show different surface electronic structures and different surface structure stabilities. The conclusion agrees well with Wu's experimental work. The different absorbed alkali metals on the CdTe (111) surface give different adsorption characteristics which have relations not only with the valence electrons, but also with the core ones of the alkali metals. The electonic structures of Si-C alloys are different from that of Si-Ge alloys, and the energy band gaps of Si-C alloys do not increase linearly with Carbon concentration, our conclusion supports Alexander's results, but conflicts with Soref's one.

现分述如下： LMTO方法及其应用方面：1）通过对Nb（100）表面电子态分析发现清洁理想表面有三个表面态，多层弛豫表面有两个表面态；表面能大小说明多层弛豫表面更稳定，支持了LEED结果。2）通过对采用不同方法获得的几种不同Ag（111）表面稳定结构的表面能计算分析，给出了单层弛豫表面为Ag（111）表面的最稳定结构；从Ag（111）单层弛豫表面和Ag（001）表面的表面能比较，发现了Ag（001）表面表面能要比Ag（111）小的，表明了同种物质不同表面取向将表现出不同物理、化学性质，这是与实验中得出的结论是吻合的，3）通过对Si（111）表面态分析，不仅发现了Si（111）表面不仅具有居于费米能级附近的悬挂键所对应的表面态，而且还有很多表面态位于价带能量范围内，与Cohen等结果一致，H饱和slab模型背表面相当于增加了slab层的厚度，是一有效的变相增加slab层厚的方法，弛豫表面较清洁理想表面价带谱们低能端的少许移动，预示着总能降低，说明弛豫表面较清洁理想表面稳定。4）MoSi〓具有三种表面，从费米能级上态密度值大小得到单层Si表面最稳定，Mo原子为表层原子的表面最不稳定，双层Si原子表面居中的结论，这与Kemoda等人实验结果是一致的。5）通过对CdTe（111）表面表面电子态、表面结构稳定性及表面H、碱金属吸附的电子结构系列研究，不仅得出了CdTe（111）清洁及碱金属K吸附价带谱与同步辐射光电子谱相吻合的结果，而且发现了CdTe（111）表面具有四类不同原子近邻特征，表现出四类不同的表面结构及电子结构特征：不同表面态分布、不同的表面结构稳定性（表层原子与次层原子成三键有一悬挂键的表面要比表层原子与次层原子成一键有三悬挂键稳定（与Wu等人实验结果一致））、不同的H吸附特性。

All quadrilateral mesh automatic generation for regular quadric surfaces based on Auto CAD AME;2. Represent Quadric Surfaces Using NURBS and Calculate the Control Vertecs and Weights;3. Through study,the property is found out that planes cutting edgewise quadric curve and quadric intersections from the quadric surfaces become the harmonic division.

文中采用了射影几何的方法，证明了画法几何中关于两个二次曲面相交的著名的复切定理和蒙日定理，通过研究得出了周切线平面和交线平面成调和分割的性质，同时还得出了处于复切的二次曲面必存在相公切的二次曲面的性

The mainly conclusions in our research are as flowing: tungsten trioxide powders with 100 nm primary particle are obtained by spray drying,calcination and wet milling process, and an average size of quadric particle composed of agglomerated particles is 0.64 μm; tungtsen powders with 39 nm grain size and 60 -100 nm primary particle are produced directly from previous tungsten trioxide using one step reduction in hydrogen at 700℃, and an average size of quadric particle of tungsten powder is 2.91 μm; tungsten trioxide and copper tungstate compound powders with 100 nm - 200 nm primary particle are produced using ammonia metatungsten and copper nitrate as raw materials by spray drying,calcination and wet milling process;the compound powders are transformed completely into tungsten and copper compound powders by reduction in hydrogen at 700℃,in which tungsten grain size is 59 nm and copper grain size is 51 nm; primary particle size of compound powders is 80 - 120 nm,and an average size of agglomerated quadric particle is 1.86 μm; tungsten nitride powders with 35 nm grain size are prepared from tungsten trioxide powders by nitrogen treatment thoroughly in pure ammonia at 650℃, and an average size of agglomerated quadric particle is 0.64 μm in normal temperature.

研究结果表明：采用喷雾干燥—焙烧—球磨工艺可以制备出粒度约为100nm的WO_3粉体，它们在团聚后形成的二次颗粒平均粒度为0.64μm；采用一步直接氢还原方法可在700℃下从上述WO_3粉体制备出晶粒尺寸为39nm的、一次颗粒粒度为60-100nm的W粉体，其二次颗粒的平均粒度为2.91μm；以偏钨酸铵、硝酸铜为原料，采用喷雾干燥—焙烧—球磨工艺可制备出一次粒度为100-200nm的WO_3和CuWO_4混合粉体；采用氢还原工艺可在700℃下将这种粉体完全转变为W、Cu复合粉体，其中W的平均晶粒粒尺寸为59nm，Cu的平均晶粒尺寸为51nm；复合粉体的一次颗粒尺寸为80-120nm，在常温下团聚后形成的二次平均粒度为1.86μm；采用纯氨氮化工艺可以在650℃下由WO_3粉体制得WN，其晶粒尺度为35nm，在常温下团聚后的二次平均粒度为6.4μm。

与quadric surface相关的网络解释 [注：此内容来源于网络，仅供参考]

quadric surface：二次曲面

quadric 二次的 | quadric surface 二次曲面 | quadrilateral 四边形;四边形的

proper quadric surface：真二次曲面 常态二次曲面

sealing alloy 焊接用合金 | proper quadric surface 真二次曲面 常态二次曲面 | dejacketing solution 脱壳(用)溶液

proper quadric surface：真二次曲面

proper proportion of nutrient 肥料配合合理 | proper quadric surface 真二次曲面 | proper quantities 适量

quadric surface source：二次表面源

quadric surface 二次曲面 | quadric surface source 二次表面源 | quadrupolar 四极的

quadric surface fitting：二次曲面

曲面拟和:Surface fitting. | 二次曲面:quadric surface fitting | 表面成像:Surface fitting