photolithographic [,fəutə,liθə'græfik]

photolithographic的基本解释

adj.

照相平版印刷(法)的

与photolithographic相关的网络例句 [注：此内容来源于网络，仅供参考]

A conductive photolithographic film and method of forming a device using the conductive photolithographic film.

本发明涉及一种导电性照相平版印刷膜和用所述导电性照相平版印刷膜形成器件的方法。

The conductive photolithographic film comprising about 50% to about 60% of a mixture of epoxy acrylate, a thermal curing agent, and a conductive polymer; about 20% to about 30% of a lithographic reactive component; about 10% to about 15% of a photo-active material; and about 3% to about 5% of additives that enhance conductivity of the conductive photolithographic polymer.

所述导电性照相平版印刷膜包含约50％-约60％的环氧丙烯酸酯、热固化剂和导电性聚合物的混合物；约20％-约30％的平版印刷活性组分；约10％-约15％的光活性材料；和约3％-约5％的添加剂，所述添加剂增强所述导电性照相平版印刷聚合物的导电性。

This thesis proposes to use optimal method to search for the interpolation that matches with the allowable maximum range of chord error to build a curve of near field photolithographic fabrication.

同时本文提出最佳化搜寻合乎允许最大弦误差范围内之插值点方法，以建立近场光学微影加工之曲线。

与photolithographic相关的网络解释 [注：此内容来源于网络，仅供参考]

photolithographic：光刻法的

photokymograph 记录照相机 | photolithographic 光刻法的 | photolithography 影印石版术

photolithographic：光刻

光弹性学 photoelasticity | 光刻 photolithographic | 光刻线 photolithographic beam

photolithographic beam：光刻线

photoelectron 光电子 | photolithographic beam 光刻线 | photolithography 光刻法

photolithographic mask：光刻用掩模

photolayer 光敏层 | photolithographic mask 光刻用掩模 | photolithographic resolution 光刻蚀清晰度

photolithographic resolution：光刻蚀清晰度

photolithographic mask 光刻用掩模 | photolithographic resolution 光刻蚀清晰度 | photolithography 光刻法